MULTILAYER COATING EQUIPMENT
Comelec C30H ALD
The Comelec C30H ALD is designed for laboratory research and testing, precisely depositing layers of aluminum oxide (Al鈧侽鈧) and titanium oxide (TiO鈧).
Product Information
The Comelec C30H ALD multilayer deposition system鈥檚 size and performance capabilities are well-suited to apply multilayer conformal coatings for complex, three-dimensional components used in electronics, medical devices, conductors and similar applications in laboratory settings.
The C30H ALD layers Parylene and inorganic layers, specifically aluminum oxide (Al2O3) and/or titanium oxide (TiO2) using a remote plasma source to generate precursors that will trigger the surface reactions necessary to 鈥済row鈥 the layers of Parylene and ALD. The system is also equipped with a gas panel with four heated precursor lines to increase vapor pressure and temperature for precise results.
System Features
- Thermalized chamber with double-wall technology
- Patented low-contamination door
- Fully automated process with user-configurable operation parameters
- Remote plasma source
- Gas panel with 4 heated precursors
- Remote access interface using a standard browser
- Simplified maintenance design with improved access to key areas
Optional Features
- Clean room installation
- Bar code placement for traceability
- Advanced interface and web user experience
- Integrated pulley for tooling placement and removal
- Additional heated precursor lines
Specifications
Comelec C30H ALD
Overall dimension (L x W x H)
88.5 x 46 x 57 in / 225 x 116 x 145 cm
Weight
771.6 lb / 350 kg
Chamber size
11. 6 x 14.5 in / 29.5 x 37 cm
Tooling size
10.2 x 12.6 in / 26 x 32 cm
Max tooling load
220 lb / 100 kg
Dimer capacity
0.33 lb / 150 g
Power
3 x 400 V + N + PE 鈥 50 Hz, 3 x 25A 鈥 15kW
Thermalized chamber power
3 x 400V + PE 鈥 50Hz
3x 14A 鈥 9kW
3x 14A 鈥 9kW
Thermalized chamber temperature range
20掳C 鈥 80掳C
Remote plasma source
Frequency: 1.7 鈥 3MHz, Power: 3000W
Process temperature
Parylene: room temperature, ALD: 60掳C - 80掳C
